SurfPurge 10A
Solar Application
SOLAR-PNL



 


Description:

The SAS's SurfPurge 10A cleaning solution has a pH range from 10 - 11. The power of this solutions is related to its extreme negative Zeta Potential characteristic, combined with some detergency power with zero foaming result.

The SurfPurge10A is specifically desinged for removing sub micron particles and thin film organic residues from Photovoltaic Solar Cells’ surface.

 

Effects of SAS's SurfPurge10A on the Single Junction Thin Film, amorphous Silicon Solar Cell Performance
(Population Size 100 Individual Solar Cells)

 

 

Cell Efficiency

Short Circuit Current Density (mA/Cm 2)

Open Circuit Voltage (V)

Fill Factor

Shunt Resistance (Ohms)

Series Resistance (Ohms)

Initial cell performance after use of SAS SurfPurge10A

8.9

13

0.915

74

5000

12

 

 

 

 

 

 

 

After 300 hours LID

7.6

12.4

0.880

66.3

3000

16

 

 

 

 

 

 

 

% Loss/Change

14.6

4.62

3.825

10.4

40

33

 

Typical Current/Voltage Curve for Individual Solar Cell

 
SP10A
-----------------------------------------------------------------------------------------------------------------------
 
 

Dilution: One volume of SurfPurge 10A in X volume of water.

0 X 100

-----------------------------------------------------------------------------------------------------------------------
 

Dilution: One volume of SurfPurge 10A in X volume of water.

0 X 100

 
Benefits:
  1. No alkaline or alkaline earth ions, therefore one cannot see any alkaline ions after SEM/EDX analysis (No effects on P dopant, or current performance)

  2. Cleaning process can be done in room temperature (save electricity and labor)

  3. SurPurge10A has good rinseability, no need for multiple Di-water rinsing (save time)

  4. No corrosion on metal thin films due to its adjusted pH (No change in performance of cells)

  5. No pH change during wet clean process due to buffered characteristic of this solution (Provides stable and repeatable Cleaning Process)

  6. No chemical decomposition and side reactions (unexpected release of toxic compounds)

  7. SurfPurge10A can remove all sub-micron particles as well as organic residues from lithography process in short period of time.

  8. Chemical cost is very low due to its high concentration, 13 cents/L after 1:100 dilutions