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Description:
The SAS SubScrub 300 is a surfactant-based solution with a pH range around 4-5. This solution has a strong cleaning characteristics for removing particles as well as organic thin film residues. The SAS-SubScrub 300 mainly is used as a cleaning solution for glass in the field of Optical and Solar technologies. |
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Main Characteristics:
- It has a strong detergency power with very low foaming character.
- It is very soluble in water and it has very good rinseability characteristics, leaving no traces behind.
- It carries low surface tension, thus quite effective in removing sub-micron particles.
- It can be used quite efficiently in cleaning glass substrate before starting lithography process in the field of optical as well as solar technologies
- It is strongly recommended for cleaning loose particles on silicon wafers and magnetic disks with thin film of chromium, chromium oxide, NiP, carbon thin films and aluminum substrates. Use of any agitating process such as brushing process or mega sonic system will increase the effectiveness of SAS SubScrub 300 solution.
- No needs to neutralize the waste solution due to its pH (4-5) range.
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Benefits:
- Good Cleaning Power
- High thermal Stability
- High Chemical Stability
- High Water Solubility
- Good Rinseability
- High Wetability Power
- High Chelating Power
- High Detergency Power with Low Foaming characteristic
- Non-Toxic, non-Flammable
- Low cost product with a 1:20 (up to 1:30) dilution ratio for glass and aluminum surface cleaning
- No needs to neutralize the waste solution
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