Description:

The SAS SubScrub 250 is an acidic surfactant-based solution with a pH range around 2-3. This solution has strong cleaning power for removing particles due its high detergency character as well as its chelating characteristic. 

The SAS SubScrub 250 is mainly used as an ideal solution in an acid wash process rinse when one is using strong negative zeta potential solutions (alkaline solutions). It is also used as a glass cleaning solution in the field of optical and solar technologies as well as in applications where metal layers in electronic devices are pH sensitive.

Main Characteristics:

1. It has a strong detergency power with very low foaming characteristics.
2. It is very soluble in water while having very good rinseability.
3. It carries low surface tension, thus highly effective in removing sub-micron particles.
4. It can be used quite efficiently in cleaning glass substrate before starting lithography process in the field of optical as well as solar technologies. It can also be used to remove metal oxides as well as inorganic salts residue.
5. It is extremely effective in cleaning loose particles (electrostatic bonded particles) on silicon wafers or magnetic disks with thin film of chromium, chromium oxide, NiP, carbon and aluminum substrates. Use of any agitating process such as brushing process or mega sonic systems will make SAS SubScrub 250 solution even more effective.

1. Good Cleaning Power
2. High thermal Stability
3. High Chemical Stability
4. High Water Solubility
5. Good Rinseability
6. High Wetability Power
7. High Detergency Power with Low Foaming characteristic
8. Readily Biodegradable
9. Non-Toxic and Non-Flammable
10. Low cost product with a 1:15 (up to 1:30) dilution ratio