PolyScrub
 


 


Description:

The SAS-PolyScrub is a unique clean-solution for removing traces of Organo-Metal Polymers, created after a dry-etch.  This solution will not only clean hard to remove polymers but it will also make the surface of a device particle free.

The SAS-PolyScrub is an alternative substitution for a 3-mixed solution, but with more cleaning power and causing less damage to sensitive devices.  Most common application of SAS-PolyScrub is in cleaning hard to remove polymers on the optical wave-guides as well as deep trenches.

 


Cleaning hard polymers on an Optical Waveguide
( Pre & Post Surface Analysis )

 

Formation of hard polymers on surface after dry etch
 

Surface before Cleaning:


Surface Post Cleaning:
 
Benefits:
  1. Long Shelf Life
  2. Easy to Clean Silicon Polymers
  3. Easy to Clean Thin Film Organic Contamination
  4. Easy to Clean the Trace of Photoresists
  5. High Thermal Stability
  6. None Flammable
  7. Good Rinse-ability
  8. Higher etch rate in SiO2/PSG