Description:

The SAS-KimiRub14 is a cleaning solution for alkaline metal sensitive devices. It is an alternative cleaning chemical to SC1 clean solution. The SAS-KimiRub14 is formulated in two products with (SAS-KimiRub14) and without (SAS-KimiRub14S) surfactant. 

The non-surfactant SAS-KimiRub14 is mostly used for replacement of SC1 process especially in PhotoMask fabrication and memory devices. Use of any agitating system such as a Mega Sonic or a Jet Spray systems will increase the effectiveness of SAS-KimiRub solution.

Main Characteristics:

1. The SAS-KimiRub14 is recommended, where brushing is not used in the cleaning process
2. Perfect for a Mega Sonic & a Jet Spray process due to its non-foaming property
3. Prevent the formation of Micro-Crystals on surface of electronic devices after a wet etch process

1. Good Cleaning Power
2. High thermal Stability
3. High Chemical Stability
4. High Water Solubility
5. High Wetability Power
6. Non-Toxic, non-Flammable
7. Wide Cleaning Applications
8. Very Strong Zeta Potential cleaning Power
9. An alternative solution to SC1 clean solution
10. No need for any surfactant

Description:

The SAS-KimiRub 14S, is a cleaning solution with a low foaming surfactant. The SAS-KimiRub 14S is an alternative cleaning solution to remove sub-micron particles after CMP process.

Main Characteristics:

1. The SAS-KimiRub14S is recommended, where brushing is used in the cleaning process
2. Formulated to be used in a Mega Sonic & a Jet Spray process due to its non-foaming properties
3. Faster removal of Thin Films Organic contaminants
4. Excellent power to remove Sub-Micron particles

1. Good Cleaning Power
2. High thermal Stability
3. High Chemical Stability
4. High Water Solubility
5. High Wetability Power
6. Non-Toxic, non-Flammable
7. Wide Cleaning Applications
8. Very Strong Zeta Potential cleaning Power
9. An alternative solution to SC1 clean